Nico Pietroni,
Corentin Dumery,
Raphael Falque,
Mark Liu,
Teresa Vidal-Calleja,
Olga Sorkine-Hornung,
SIGGRAPH 2022
We propose a method for computing a sewing pattern of a given 3D garment model. Our algorithm segments an input 3D garment shape into patches and computes their 2D parameterization, resulting in pattern pieces that can be cut out of fabric and sewn together to manufacture the garment. Unlike the general state-of-the-art approaches for surface cutting and flattening, our method explicitly targets garment fabrication. It accounts for the unique properties and constraints of tailoring, such as seam symmetry, the usage of darts, fabric grain alignment, and a flattening distortion measure that models woven fabric deformation, respecting its anisotropic behavior. We bootstrap a recent patch layout approach developed for quadrilateral remeshing and adapt it to the purpose of computational pattern making, ensuring that the deformation of each pattern piece stays within prescribed bounds of cloth stress. While our algorithm can automatically produce the sewing patterns, it is fast enough to admit user input to creatively iterate on the pattern design. Our method can take several target poses of the 3D garment into account and integrate them into the sewing pattern design. We demonstrate results on both skintight and loose garments, showcasing the versatile application possibilities of our approach.
Data: http://www.quadmesh.cloud/parafashion/Figures_Pattern_Making.zip
#Website: www.google.com
DOI: TBD ACM Transactions on Graphics (SIGGRAPH), 2022
BibTex
@article{,
author = {Pietroni, Nico and Dumery, Corentin and Falque, Raphael and Liu, Mark and Vidal-Calleja, Teresa and Sorkine-Hurnung, Olga},
title = {Computational Pattern Making from 3D Garment Models
},
year = {2022},
issue_date = {August 2022},
publisher = {Association for Computing Machinery},
address = {New York, NY, USA},
volume = {41},
number = {4},
issn = {?},
url = {https://doi.org/??},
doi = {??},
abstract = {We propose a method for computing a sewing pattern of a given 3D garment model. Our algorithm segments an input 3D garment shape into patches and computes their 2D parameterization, resulting in pattern pieces that can be cut out of fabric and sewn together to manufacture the garment. Unlike the general state-of-the-art approaches for surface cutting and flattening, our method explicitly targets garment fabrication. It accounts for the unique properties and constraints of tailoring, such as seam symmetry, the usage of darts, fabric grain alignment, and a flattening distortion measure that models woven fabric deformation, respecting its anisotropic behavior. We bootstrap a recent patch layout approach developed for quadrilateral remeshing and adapt it to the purpose of computational pattern making, ensuring that the deformation of each pattern piece stays within prescribed bounds of cloth stress. While our algorithm can automatically produce the sewing patterns, it is fast enough to admit user input to creatively iterate on the pattern design. Our method can take several target poses of the 3D garment into account and integrate them into the sewing pattern design. We demonstrate results on both skintight and loose garments, showcasing the versatile application possibilities of our approach.},
journal = {ACM Trans. Graph.},
articleno = {157},
numpages = {14},
keywords = {geometry processing, modelling, fashion design}
}
git clone --recursive https://github.com/nicopietroni/parafashion
git submodule update --init --recursiveThe following packages are required: qt5-default libqt5svg5-dev freeglut3-dev (e.g. sudo apt install ... on Debian based systems).
mkdir build
cd build
cmake ..
make -j parafashion
Then, simply run parafashion with an obj or ply mesh as command-line argument:
./parafashion <Mesh>
Open the .pro file, all the path in the .pri should be already ok.
- The output patch subdivided mesh (suffix patch.obj): Per face, per patch colored mesh.
- The output patch index per face (suffix patch.txt)
- The output per face per vert UV (suffix UV.txt)
- For each patch the UV and 3D (suffix patch_UV_#.obj and patch_3D_#.obj)
- patch decomposition ready to be fabricated (suffix patch.svg)
The code has slightly changed and the results could be different from the ones showed in the paper.